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Milano Bicocca 

magna greciae

UNIMORE Sigillo2015

LOGO TV con Dipartimenti

BO FI UD 400




IIT

FEDERCHIMICA NEW

Klopman International

LEONARDO



ZEISS





INRIM

iss

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PROTECT

  

IN COOPERATION WITH

 



HT.I.B

sveglia 09:00 - 10:30

Advanced Characterization Techniques
SYNOPSIS
HT.I.B.1
WS.I.A.1
Marco CANTONI
EPFL, ENT-R-CIME, Lausanne, Switzerland
Focused Ion Beam Nano-Tomography and 3D EDX: What can you expect and where are the limits
HT.I.B.2
WS.I.A.2
Pasqualantonio PINGUE
NEST Scuola Normale Superiore, Pisa
Lithography and characterization of nanostructures by scanning electron microscopy based techniques  abst
Chair: Giulio LAMEDICA, Carl Zeiss Italia
    
In collaboration with: ZEISS

SYNOPSIS


Scanning Electron Microcopy it is a well-established surface imaging technique at nanoscale level and, in the recent years, huge development have been done to extend its capabilities to get a complex advanced platform for a complete sample characterization and device fabrication.

Recent improvements in EM and in complementary integrated technologies like: FIB (Focused Ion Beam) for 3D nano-tomography and nano machining; EDX (Energy Dispersive Xray) for advanced chemical analisys; pattern generator for lithography and nanodevice fabrication, and manipulation for nano features handling; are offering a wide range of opportunities bringing Scanning Electron Microscopy to the next level.

In this session will be illustrated latest experiments in these fields, carried out by major European experts, with outstanding  results obtained thanks to the Zeiss technology.


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