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Milano Bicocca 

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ZEISS





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TT.II.A

sveglia 14:00 - 15:30

Microscopy methods for Nanotechnology and Nanofabrication
SYNOPSIS
TT.II.A.1
WS.I.C.1
Giulio LAMEDICA
Carl Zeiss Italia SpA
Extending the Frontiers of Nanotechnology  with ion and electron beam solutions Technique and Applications
TT.II.A.2
WS.I.C.2
Massimo CUSCUNA'
CNR NANOTEC, Lecce
Nanostructures for Photonics   abst
TT.II.A.3
WS.I.C.3
Matthias VAUPEL
Carl Zeiss Microscopy GmbH, Germany
Comparing Confocal and Interference Contrast Microscopy in Topography, Roughness, and Film Thickness Measurement  abst
Chair: Luca ORTOLANI, CNR-MM, Bologna
    In collaboration with: ZEISS

SYNOPSIS

 

Nanotechnology is rapidly extending in really complex and fine structures and Electron and Ion Microscopy are playing a key role in nano patterning and sample modification, with outstanding solutions in machining, deposition and characterization at the nanoscale level. Light microscopy contributes to sample and process understanding and control, providing complementary information.


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All truths are easy to understand once they are discovered; the point is to discover them.

Galileo Galilei

Anything one man can imagine, other men can make real.

Jules Verne

Scientist investigate that which already is; engineers create that which has never been.

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I am not discouraged, because every wrong attempt discarded is another step forward.

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