Monday, 16 September 2019

Workshops WS.I

WS.I
Plasma-Therm Technical Workshop:  Fundamentals of Plasma Processing
(Etching and Deposition)

Sep 21
09:00 - 13:00

Co-organized and Sponsored by: ASSING

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The workshop will focus on the fundamentals of plasma etching and deposition. Lectures will include the basics of plasma reactors and mechanisms for etching and deposition and review state-of-the-art etching and deposition technologies as applied to semiconductor, MEMS, and nanofabrication. Talks will cover compound semiconductor, dielectric, and deep silicon etching as well as PECVD and high density plasma CVD of silicon based materials. Fundamental and new ideas for endpoint detection and sample thermal budget management will be presented.

 

 

PRESENTATIONS LIST

, SCIENTIFIC PATRONAGE

 


  NANOINNOVATION'S GOT TALENT

 
call for young researchers
by BRACCO FOUNDATION

 

 

, INSTITUTIONAL PATRONAGE





  INSTITUTIONAL PARTNERS

 

    

 

  CORPORATE PARTNERS

     

 

Technical Support

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Organizing Secretariat

Dr. Cristina Gippa

+ 39 339 771 4107
+ 39 388 1785318
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Dr. Federica Lodato

+ 39 335 7253927
+ 39   06 8848831
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